A Nanopure REVOLUTION in water.
Global demand for particle free water is growing at an ever-increasing pace due to the rise in global R&D expenditure and growing demand from semiconductor industries and life science.
The cost for ultrapure water is rising and also affect the enviroment in a negative way.
The amount of water used in the semiconductor industry is equal to the amount of water used by a small city during a year.
Also chemicals are added making the water harmful to release back into nature!
The need to reduce the amoun of water and chemicals needed is higher then ever before AND also increasing the purity level of the water.
NSS Water Enhancement Technology has the solution.
WET (Water Enhancement Tool) can produce nanopure water totally free of ANY contaminations above 5-10 nanometers, our nanopure water is 1000 times more pure then todays type 1 water AND the use of water in a semiconductor factory can be reduced with up to 90%.
This is a NANOPURE WATER REVOLUTION.
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Our NPW (nanopure water) is used in the semiconductor and life science industries the most, and is an ideal component for any work in laboratories.
Applications include:
Wafer rinse
Cleaning and etching wafers
Trace Analysis
Polymerase chain reaction (PCR)
WET technology revolutionize the production of UPW, significantly improve pureness, and reduce the volume of UPW needed, in fact WET produce NPW (nanopure water).
WET can produce NPW on demand,just in time with any feed water avalible, enviromental friendly.
WET Benefits
-Low cost for producing next generation water
-Highest purity avalible, no particles above 5nm
-Mobile, WET can be used where needed
-Easy to use
-Low service cost
-Easy to scale to fit customers demand
See video pitch at this link:
https://youtu.be/e7Kor04Q_WY